Publishable Deliverables and Publications

• Pushing deep greyscale lithography beyond 100-µm pattern depth with a novel photoresist
• Challenges of photomask-based greyscale lithography with a highly sensitive positive photoresist designed for > 100 µm deep greyscale patterns
• Combining laser interference lithography and direct write lithography for hierarchical structures fabrication
• Data-driven Optimization of Maskless Grayscale Laser Lithography
• OPTIMAL_Deliverable D1.2 Lithographic patterning
• OPTIMAL_Deliverable D7.1 Dissemination plan